Publicaciones en colaboración con investigadoras/es de Nagoya University (49)

2018

  1. Large area planar stanene epitaxially grown on Ag(1 1 1)

    2D Materials, Vol. 5, Núm. 2

2015

  1. Discovery of the K4 Structure Formed by a Triangular π Radical Anion

    Journal of the American Chemical Society, Vol. 137, Núm. 24, pp. 7612-7615

2012

  1. Etched profile control in anisotropic etching of silicon by TMAH+Triton

    Journal of Micromechanics and Microengineering, Vol. 22, Núm. 6

  2. Evolutionary determination of kinetic Monte Carlo rates for the simulation of evolving surfaces in anisotropic etching of silicon

    Journal of Micromechanics and Microengineering, Vol. 22, Núm. 8

  3. Sharp silicon tips with different aspect ratios in wet etching/DRIE and surfactant-modified TMAH etching

    Sensors and Actuators, A: Physical

2011

  1. A genetic algorithm based Kinetic Monte Carlo simulation for the evolution of complex surface in anisotropic wet etching

    2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11

  2. FABRICATION OF SHARP TIPS WITH HIGH ASPECT RATIO BY SURFACTANT-MODIFIED WET ETCHING FOR THE AFM PROBE

    2011 IEEE 24TH INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS)

  3. Fabrication of novel microstructures based on orientation-dependent adsorption of surfactant molecules in a TMAH solution

    Journal of Micromechanics and Microengineering, Vol. 21, Núm. 1

  4. Fabrication of sharp tips with high aspect ratio by surfactant-modified wet etching for the AFM probe

    Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

  5. Faster and exact implementation of the continuous cellular automaton for anisotropic etching simulations

    Journal of Micromechanics and Microengineering, Vol. 21, Núm. 2

  6. Octree-based, GPU implementation of a continuous cellular automaton for the simulation of complex, evolving surfaces

    Computer Physics Communications, Vol. 182, Núm. 3, pp. 628-640

  7. Reliability assessment of the complete 3D etch rate distribution of Si in anisotropic etchants based on vertically micromachined wagon wheel samples

    Journal of Micromechanics and Microengineering, Vol. 21, Núm. 12

2010

  1. Atomistic mechanism for the macroscopic effects induced by small additions of surfactants to alkaline etching solutions

    Sensors and Actuators, A: Physical

  2. Combined experimental and ab initio study of the electronic structure of narrow-diameter single-wall carbon nanotubes with predominant (6,4),(6,5) chirality

    Physical Review B - Condensed Matter and Materials Physics, Vol. 82, Núm. 12

  3. Manufacture and Processing of MEMS Structures

    Handbook of Silicon Based MEMS Materials and Technologies (Elsevier Inc.), pp. 157-177

  4. Octree-search Kinetic Monte Carlo

    Sensors and Actuators, A: Physical, Vol. 159, Núm. 1, pp. 64-68

  5. Orientation-dependent surface morphology of crystalline silicon during anisotropic etching using a continuous cellular automaton

    Journal of Micromechanics and Microengineering, Vol. 20, Núm. 1

  6. Silicon micromachining based on surfactant-added tetramethyl ammonium hydroxide: Etching mechanism and advanced applications

    Japanese Journal of Applied Physics, Vol. 49, Núm. 5 PART 1, pp. 0567021-0567029

  7. Wet Etching of Silicon

    Handbook of Silicon Based MEMS Materials and Technologies (Elsevier Inc.), pp. 375-407

2009

  1. Adsorbed surfactant thickness on a Si wafer dominating etching properties of TMAH solution

    20th Anniversary MHS 2009 and Micro-Nano Global COE - 2009 International Symposium on Micro-NanoMechatronics and Human Science