MIGUEL ANGEL
GOSALVEZ AYUSO
INVESTIGADOR/A DOCTOR/A PERMANENTE
Centro de Física de Materiales
San Sebastián, EspañaPublicaciones en colaboración con investigadoras/es de Centro de Física de Materiales (15)
2023
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Etch and growth rates of GaN for surface orientations in the <0001> crystallographic zone: Step flow and terrace erosion/filling via the Continuous Cellular Automaton
Materials Science in Semiconductor Processing, Vol. 153
2020
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Dominant contributions to the apparent activation energy in two-dimensional submonolayer growth: Comparison between Cu/Ni(111) and Ni/Cu(111)
Journal of Physics Condensed Matter, Vol. 32, Núm. 44
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Multiscale Analysis of Phase Transformations in Self-Assembled Layers of 4,4′-Biphenyl Dicarboxylic Acid on the Ag(001) Surface
ACS Nano, Vol. 14, Núm. 6, pp. 7269-7279
2018
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The Maximum Positive Curvature Recognition Method to Determine Etch Profiles in Wet Etching of Quartz on at and BT Cuts
Journal of Microelectromechanical Systems, Vol. 27, Núm. 4, pp. 730-738
2017
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Microscopic Origin of the Apparent Activation Energy in Diffusion-Mediated Monolayer Growth of Two-Dimensional Materials
Journal of Physical Chemistry C, Vol. 121, Núm. 37, pp. 20315-20322
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Transient and Stable Profiles During Anisotropic Wet Etching of Quartz
Journal of Microelectromechanical Systems, Vol. 26, Núm. 5, pp. 1063-1072
2016
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Fluctuations during anisotropic etching: Local recalibration and application to si{110}
Journal of Microelectromechanical Systems, Vol. 25, Núm. 4, pp. 788-798
2015
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Particle swarm optimization-based continuous cellular automaton for the simulation of deep reactive ion etching
Journal of Micromechanics and Microengineering, Vol. 25, Núm. 5
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Removal probability function for Kinetic Monte Carlo simulations of anisotropic etching of silicon in alkaline etchants containing additives
Sensors and Actuators, A: Physical, Vol. 233, pp. 451-459
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Simulation of microloading and ARDE in DRIE
2015 Transducers - 2015 18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015
2014
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Anisotropic etching on Si{1 1 0}: Experiment and simulation for the formation of microstructures with convex corners
Journal of Micromechanics and Microengineering, Vol. 24, Núm. 12
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Complex chiral colloids and surfaces via high-index off-cut silicon
Nano Letters, Vol. 14, Núm. 5, pp. 2934-2940
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Evolutionary Kinetic Monte Carlo: Atomistic rates of surface-mediated processes from surface morphologies
Journal of Physical Chemistry C, Vol. 118, Núm. 22, pp. 11636-11648
2013
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Implementation and evaluation of the Level Set method: Towards efficient and accurate simulation of wet etching for microengineering applications
Computer Physics Communications, Vol. 184, Núm. 10, pp. 2299-2309
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Level set implementation for the simulation of anisotropic etching: Application to complex MEMS micromachining
Journal of Micromechanics and Microengineering, Vol. 23, Núm. 7