Publicaciones en colaboración con investigadoras/es de Aalto University (45)

2020

  1. Modeling of silicon etching

    Handbook of Silicon Based MEMS Materials and Technologies (Elsevier), pp. 345-365

  2. Wet etching of silicon

    Handbook of Silicon Based MEMS Materials and Technologies (Elsevier), pp. 447-480

2015

  1. Design and performance characterization of electronic structure calculations on massively parallel supercomputers: A case study of GPAW on the Blue Gene/P architecture

    Concurrency Computation , Vol. 27, Núm. 1, pp. 69-93

  2. Localized surface plasmon resonance in silver nanoparticles: Atomistic first-principles time-dependent density-functional theory calculations

    Physical Review B - Condensed Matter and Materials Physics, Vol. 91, Núm. 11

  3. Modeling of Silicon Etching

    Handbook of Silicon Based MEMS Materials and Technologies: Second Edition (Elsevier Inc.), pp. 333-353

  4. Science and technology roadmap for graphene, related two-dimensional crystals, and hybrid systems

    Nanoscale, Vol. 7, Núm. 11, pp. 4598-4810

  5. Static correlation and electron localization in molecular dimers from the self-consistent RPA and GW approximation

    Physical Review B - Condensed Matter and Materials Physics, Vol. 91, Núm. 16

  6. Wet Etching of Silicon

    Handbook of Silicon Based MEMS Materials and Technologies: Second Edition (Elsevier Inc.), pp. 470-502

2012

  1. Challenges in truncating the hierarchy of time-dependent reduced density matrices equations

    Physical Review B - Condensed Matter and Materials Physics, Vol. 85, Núm. 23

  2. Inversed linear dichroism in F K-edge NEXAFS spectra of fluorinated planar aromatic molecules

    Physical Review B - Condensed Matter and Materials Physics, Vol. 86, Núm. 7

2010

  1. Octree-search Kinetic Monte Carlo

    Sensors and Actuators, A: Physical, Vol. 159, Núm. 1, pp. 64-68

2008

  1. A continuous cellular automaton for the atomistic simulation of evolving surface in anisotropic etching

    Proceedings - 4th International Conference on Natural Computation, ICNC 2008

  2. Adsorption of metal impurities on H-terminated Si surfaces and their influence on the wet chemical etching of Si

    Journal of Physics Condensed Matter, Vol. 20, Núm. 48

  3. An improved anisotropic wet etching process for the fabrication of silicon MEMS structures using a single etching mask

    MEMS 2008: 21ST IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST