Improvement in smoothness of anisotropically etched silicon surfaces: Effects of surfactant and TMAH concentrations

  1. Cheng, D.
  2. Gosálvez, M.A.
  3. Hori, T.
  4. Sato, K.
  5. Shikida, M.
Revue:
Sensors and Actuators, A: Physical

ISSN: 0924-4247

Année de publication: 2006

Volumen: 125

Número: 2

Pages: 415-421

Type: Article

DOI: 10.1016/J.SNA.2005.08.022 GOOGLE SCHOLAR

Objectifs de Développement Durable

La source de données: Scopus