Instituto de Microelectrónica de Barcelona -ko ikertzaileekin lankidetzan egindako argitalpenak (3)

2011

  1. Guided self-assembly of block-copolymer for CMOS technology: A comparative study between grapho-epitaxy and surface chemical modification

    Proceedings of SPIE - The International Society for Optical Engineering

2010

  1. LENS (lithography enhancement toward nano scale): A European project to support double exposure and double patterning technology development

    Proceedings of SPIE - The International Society for Optical Engineering

2009

  1. Protein patterning on the micro-and nanoscale by thermal nanoimprint lithography on a new functionalized copolymer

    Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures