LENS (lithography enhancement toward nano scale): A European project to support double exposure and double patterning technology development

  1. Cantu, P.
  2. Baldi, L.
  3. Piacentini, P.
  4. Sytsma, J.
  5. Le Gratiet, B.
  6. Gaugiran, S.
  7. Wong, P.
  8. Miyashita, H.
  9. Atzei, L.R.
  10. Buch, X.
  11. Verkleij, D.
  12. Toublan, O.
  13. Perez-Murano, F.
  14. Mecerreyes, D.
Actas:
Proceedings of SPIE - The International Society for Optical Engineering

ISSN: 1996-756X 0277-786X

ISBN: 9780819480545

Año de publicación: 2010

Volumen: 7640

Tipo: Aportación congreso

DOI: 10.1117/12.846030 GOOGLE SCHOLAR