POLYMAT. Material Polimerikoen Unibertsitate Institutua
Institutoa
Interuniversity Microelectronics Centre
Lovaina, BélgicaInteruniversity Microelectronics Centre-ko ikertzaileekin lankidetzan egindako argitalpenak (1)
2010
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LENS (lithography enhancement toward nano scale): A European project to support double exposure and double patterning technology development
Proceedings of SPIE - The International Society for Optical Engineering