Selective laser ablation in resists and block copolymers for high resolution lithographic patterning

  1. Olynick, D.L.
  2. Perera, P.
  3. Schwartzberg, A.
  4. Kulshreshta, P.
  5. De Oteyza, D.G.
  6. Jarnagin, N.
  7. Henderson, C.
  8. Sun, Z.
  9. Gunkel, I.
  10. Russell, T.
  11. Budden, M.
  12. Rangelow, I.W.
Revue:
Journal of Photopolymer Science and Technology

ISSN: 1349-6336,  0914-9244

Année de publication: 2015

Volumen: 28

Número: 5

Pages: 663-668

Type: Article

DOI: 10.2494/PHOTOPOLYMER.28.663 GOOGLE SCHOLAR lock_openAccès ouvert editor
La source de données: Scopus