Selective laser ablation in resists and block copolymers for high resolution lithographic patterning

  1. Olynick, D.L.
  2. Perera, P.
  3. Schwartzberg, A.
  4. Kulshreshta, P.
  5. De Oteyza, D.G.
  6. Jarnagin, N.
  7. Henderson, C.
  8. Sun, Z.
  9. Gunkel, I.
  10. Russell, T.
  11. Budden, M.
  12. Rangelow, I.W.
Aldizkaria:
Journal of Photopolymer Science and Technology

ISSN: 1349-6336,  0914-9244

Argitalpen urtea: 2015

Alea: 28

Zenbakia: 5

Orrialdeak: 663-668

Mota: Artikulua

DOI: 10.2494/PHOTOPOLYMER.28.663 GOOGLE SCHOLAR lock_openSarbide irekia editor
Datuen iturria: Scopus