Selective laser ablation in resists and block copolymers for high resolution lithographic patterning

1. Olynick, D.L.
2. Perera, P.
3. Schwartzberg, A.
4. Kulshreshta, P.
5. De Oteyza, D.G.
6. Jarnagin, N.
7. Henderson, C.
8. Sun, Z.
9. Gunkel, I.
10. Russell, T.
11. Budden, M.
12. Rangelow, I.W.

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DOI: 10.2494/PHOTOPOLYMER.28.663 GOOGLE SCHOLAR lock_openOpen access editor

Data source: Scopus