LENS (lithography enhancement toward nano scale): A European project to support double exposure and double patterning technology development

  1. Cantu, P.
  2. Baldi, L.
  3. Piacentini, P.
  4. Sytsma, J.
  5. Le Gratiet, B.
  6. Gaugiran, S.
  7. Wong, P.
  8. Miyashita, H.
  9. Atzei, L.R.
  10. Buch, X.
  11. Verkleij, D.
  12. Toublan, O.
  13. Perez-Murano, F.
  14. Mecerreyes, D.
Proceedings:
Proceedings of SPIE - The International Society for Optical Engineering

ISSN: 1996-756X 0277-786X

ISBN: 9780819480545

Year of publication: 2010

Volume: 7640

Type: Conference paper

DOI: 10.1117/12.846030 GOOGLE SCHOLAR