Hydrogen dissociation and diffusion near the Si<111>/a-SiO2 interface: Understanding degradation in MOSFETs
- Sheikholeslam, S.A.
- Manzano, H.
- Grecu, C.
- Ivanov, A.
ISSN: 1096-3677, 0749-6036
Argitalpen urtea: 2018
Alea: 120
Orrialdeak: 561-568
Mota: Artikulua