Removal probability function for Kinetic Monte Carlo simulations of anisotropic etching of silicon in alkaline etchants containing additives
- Zhang, H.
- Xing, Y.
- Gosálvez, M.A.
- Pal, P.
- Sato, K.
Revue:
Sensors and Actuators, A: Physical
ISSN: 0924-4247
Année de publication: 2015
Volumen: 233
Pages: 451-459
Type: Article