Removal probability function for Kinetic Monte Carlo simulations of anisotropic etching of silicon in alkaline etchants containing additives

  1. Zhang, H.
  2. Xing, Y.
  3. Gosálvez, M.A.
  4. Pal, P.
  5. Sato, K.
Journal:
Sensors and Actuators, A: Physical

ISSN: 0924-4247

Year of publication: 2015

Volume: 233

Pages: 451-459

Type: Article

DOI: 10.1016/J.SNA.2015.07.031 GOOGLE SCHOLAR

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