Evolutionary determination of kinetic Monte Carlo rates for the simulation of evolving surfaces in anisotropic etching of silicon

  1. Xing, Y.
  2. Gosálvez, M.A.
  3. Sato, K.
  4. Tian, M.
  5. Yi, H.
Revue:
Journal of Micromechanics and Microengineering

ISSN: 0960-1317,  1361-6439

Année de publication: 2012

Volumen: 22

Número: 8

Type: Article

DOI: 10.1088/0960-1317/22/8/085020 GOOGLE SCHOLAR

Objectifs de Développement Durable

La source de données: Scopus