Publicaciones en colaboración con investigadoras/es de Instituto de Instrumentación para Imagen Molecular (13)

2024

  1. Demonstration of event position reconstruction based on diffusion in the NEXT-white detector

    European Physical Journal C, Vol. 84, Núm. 5

  2. Design, characterization and installation of the NEXT-100 cathode and electroluminescence regions

    Journal of Instrumentation, Vol. 19, Núm. 2

  3. Measurement of energy resolution with the NEXT-White silicon photomultipliers

    Journal of High Energy Physics, Vol. 2024, Núm. 9

2023

  1. A compact dication source for Ba2+ tagging and heavy metal ion sensor development

    Journal of Instrumentation, Vol. 18, Núm. 7

  2. Demonstration of neutrinoless double beta decay searches in gaseous xenon with NEXT

    Journal of High Energy Physics, Vol. 2023, Núm. 9

  3. NEXT-CRAB-0: a high pressure gaseous xenon time projection chamber with a direct VUV camera based readout

    Journal of Instrumentation, Vol. 18, Núm. 8

  4. Reflectance and fluorescence characteristics of PTFE coated with TPB at visible, UV, and VUV as a function of thickness

    Journal of Instrumentation, Vol. 18, Núm. 3

2022

  1. Ba+2 ion trapping using organic submonolayer for ultra-low background neutrinoless double beta detector

    Nature Communications, Vol. 13, Núm. 1

2013

  1. Implementation and evaluation of the Level Set method: Towards efficient and accurate simulation of wet etching for microengineering applications

    Computer Physics Communications, Vol. 184, Núm. 10, pp. 2299-2309

  2. Level set implementation for the simulation of anisotropic etching: Application to complex MEMS micromachining

    Journal of Micromechanics and Microengineering, Vol. 23, Núm. 7

2012

  1. Evolutionary continuous cellular automaton for the simulation of wet etching of quartz

    Journal of Micromechanics and Microengineering, Vol. 22, Núm. 2

2011

  1. Octree-based, GPU implementation of a continuous cellular automaton for the simulation of complex, evolving surfaces

    Computer Physics Communications, Vol. 182, Núm. 3, pp. 628-640

  2. Reliability assessment of the complete 3D etch rate distribution of Si in anisotropic etchants based on vertically micromachined wagon wheel samples

    Journal of Micromechanics and Microengineering, Vol. 21, Núm. 12