Adsorbed surfactant thickness on a Si wafer dominating etching properties of TMAH solution

  1. Tang, B.
  2. Gosalvez, M.A.
  3. Pal, P.
  4. Itoh, S.
  5. Hida, H.
  6. Shikida, M.
  7. Sato, K.
Actes de conférence:
20th Anniversary MHS 2009 and Micro-Nano Global COE - 2009 International Symposium on Micro-NanoMechatronics and Human Science

ISBN: 9781424450954

Année de publication: 2009

Pages: 48-52

Type: Communication dans un congrès

DOI: 10.1109/MHS.2009.5352098 GOOGLE SCHOLAR
La source de données: Scopus