Advances in the development of trifluoromethoxylation reagents

  1. Wang, Q.
  2. Zhang, X.
  3. Sorochinsky, A.E.
  4. Butler, G.
  5. Han, J.
  6. Soloshonok, V.A.
Aldizkaria:
Symmetry

ISSN: 2073-8994

Argitalpen urtea: 2021

Alea: 13

Zenbakia: 12

Mota: Berrikuspena

DOI: 10.3390/SYM13122380 GOOGLE SCHOLAR lock_openSarbide irekia editor