Ab initio Modelling of Plasmons in Metal-semiconductor Bilayer Transition-metal Dichalcogenide Heterostructures

  1. Sen, H.S.
  2. Xian, L.
  3. H. da Jornada, F.
  4. Louie, S.G.
  5. Rubio, A.
Journal:
Israel Journal of Chemistry

ISSN: 1869-5868,  0021-2148

Year of publication: 2017

Volume: 57

Issue: 6

Pages: 540-546

Type: Article

DOI: 10.1002/IJCH.201600122 GOOGLE SCHOLAR lock_openOpen access editor
Data source: Scopus