Effect of V concentration in TiSiN monolayer coating on chip formation mechanism and chip sliding velocity during dry turning of Ti–6Al–4V alloy

  1. Kumar, C.S.
  2. Urbikain, G.
  3. De Lucio, P.F.
  4. Pérez-Salinas, C.
  5. De Lacalle, L.N.L.
  6. Fernandes, F.
Journal:
Journal of Materials Research and Technology

ISSN: 2214-0697,  2238-7854

Year of publication: 2024

Volume: 32

Pages: 4456-4464

Type: Article

DOI: 10.1016/J.JMRT.2024.09.007 GOOGLE SCHOLAR lock_openOpen access editor
Data source: Scopus