Effect of V concentration in TiSiN monolayer coating on chip formation mechanism and chip sliding velocity during dry turning of Ti–6Al–4V alloy

  1. Kumar, C.S.
  2. Urbikain, G.
  3. De Lucio, P.F.
  4. Pérez-Salinas, C.
  5. De Lacalle, L.N.L.
  6. Fernandes, F.
Zeitschrift:
Journal of Materials Research and Technology

ISSN: 2214-0697,  2238-7854

Datum der Publikation: 2024

Ausgabe: 32

Seiten: 4456-4464

Art: Artikel

DOI: 10.1016/J.JMRT.2024.09.007 GOOGLE SCHOLAR lock_openOpen Access editor
Datenquelle: Scopus