Orientation- and concentration-dependent surfactant adsorption on silicon in aqueous alkaline solutions: Explaining the changes in the etch rate, roughness and undercutting for MEMS applications

1. Gosálvez, M.A.
2. Tang, B.
3. Pal, P.
4. Sato, K.
5. Kimura, Y.
6. Ishibashi, K.