Guided self-assembly of block-copolymer for CMOS technology: A comparative study between grapho-epitaxy and surface chemical modification

  1. Oria, L.
  2. De Luzuriaga, A.R.
  3. Chevalier, X.
  4. Alduncin, J.A.
  5. Mecerreyes, D.
  6. Tiron, R.
  7. Gaugiran, S.
  8. Perez-Murano, F.
Actes de conférence:
Proceedings of SPIE - The International Society for Optical Engineering

ISSN: 0277-786X

ISBN: 9780819485298

Année de publication: 2011

Volumen: 7970

Type: Communication dans un congrès

DOI: 10.1117/12.878486 GOOGLE SCHOLAR
La source de données: Scopus