Fluctuations during anisotropic etching: Local recalibration and application to si{110}

  1. Gosalvez, M.A.
  2. Li, Y.
  3. Ferrando, N.
  4. Pal, P.
  5. Sato, K.
  6. Xing, Y.
Revue:
Journal of Microelectromechanical Systems

ISSN: 1057-7157

Année de publication: 2016

Volumen: 25

Número: 4

Pages: 788-798

Type: Article

DOI: 10.1109/JMEMS.2016.2562026 GOOGLE SCHOLAR

Objectifs de Développement Durable

La source de données: Scopus